Reactive ion etching
Sukurta: 26 November 2018
- Unit: Faculty of Physics
- Keywords: Etching of semiconductor structures, inorganic semiconductors
This service provides possibility to dry etch various inorganic semiconductors mesa structures. Preferable size of the wafer is 2’’but it is possible to etch the samples up to 8'' in diameter. Etch aspect ratio is 20:1.
Application. This service is relevant for inorganic semiconductor engineering industry.